The wire array was used as working electrode, a chunk of silver paint-coated ITO glass was used as reference electrode,
MILF same as the pseudo-reference electrode used in the electrochemical chamber. Pt wire was used as counter electrode. Air/argon-saturated minimal medium was ready by bubbling air/argon in minimal medium for 30 min. Such minimal medium was used as electrolyte. The LSV was obtained by scanning from 1.Zero to −0.5 V vs. RHE on the pace of 5 mV s─1. 1.5, forty mm × 22 mm, SPI supplies), wet etched with 6 M HCl into two isolated electrodes, was used as the highest cowl of the chamber. One part of the ITO was sputtered with 7-nm Pt and used because the counter electrode; the opposite one, coated with silver paint (Ted Pella, Inc) at the downstream direction, was designated because the Ag pseudo-reference electrode. Previous to experiment, the Ag pseudo-reference electrode was calibrated within the ZoBell’s solution (see methodology under). The pseudo-references maintain a stable 0.31-0.32 V vs.
In this study, to obtain the relationship between EIS spectra and cell capacity degradation, our previously reported physics-based EIS model is further utilized to interpret EIS spectra of Li-NMC(5:2:3) half-cell measured under cycling. The EIS spectra show that the polarization impedance (Rp) increases with the number of cycles under different open circuit voltages (OCVs), especially in the mid-frequency range. After interpreting EIS spectra by the physics-based model, we found that the diffusion coefficient, ionic conductivity, and cathode reaction rate at different OCVs all decrease with the number of cycles. The impedance variation caused by the change of cathode reaction rate during cycles is much more significant than that caused by the other two parameters. Furthermore, the cell capacity degradation is linearly related to the charge transfer resistance (Rct2) caused by cathode/electrolyte interface reaction rate at specific OCVs and it could serve as the indicator of cell capacity fade beyond 10 cycles.
The Diocese of Nottingham, England, is a Roman Catholic diocese of the Latin Church and a suffragan in the ecclesiastical province of the Metropolitan Diocese of
Westminster. The diocese covers an space of 13,074 square kilometres (5,048 sq mi), taking in the English counties of Nottinghamshire (now excluding the district of Bassetlaw), Leicestershire, most of Derbyshire, Rutland and Lincolnshire. The episcopal seat is the Cathedral Church of St Barnabas in Nottingham. The suitable Reverend Patrick McKinney is the 10th Bishop of Nottingham. It was one of twelve English dioceses created at the restoration of the hierarchy by Pius IX in 1850, embracing the counties of Nottingham, Leicester, Derby, Lincoln and Rutland. These had comprised part of the Apostolic Vicariate of the Midland District, when on the request of King James II in 1685, the Holy See divided England into four vicariates: the London, the Northern, the Midland and the Western. Before 1840, when the number of vicars apostolic was elevated from 4 to eight, the Midland District consisted of fifteen counties.
The collection grew as the Smithsonian buildings grew, and the collection was housed in one or more Smithsonian buildings on the National Mall. In 1920, the National Gallery of Art was separated from the National Museum, becoming its own branch of the Smithsonian, with William Henry Holmes as its first director. By this time, space had become critical: "Collections to the value of several millions of dollars are in storage or temporarily on exhibition and are crowding out important exhibits and producing a congested condition in the Natural History, Industrial Arts, and Smithsonian Buildings". In 1924, architect Charles A. Platt drew up preliminary plans for a National Gallery of Art to be built on the block next to the Natural History Museum. However, this building was never constructed. In 1937, the National Gallery of Art became the National Collection of Fine Arts (NCFA), because Andrew Mellon insisted that the previous moniker be given to a new institution formed through his donation of a large art collection.
500 μm-thick, 4′ Si wafer (p-type, boron-doped, 〈100〉 aspect-oriented, 1-10 Ω cm-1, University wafer) was patterned by a contact aligner (Carl Suss MA6) with photoresist (MicroChemicals AZ5214E), and was then developed with MicroChemicals AZ 400K. The microwire array morphology was created by a subsequent reactive ion etching (Unaxis Versaline, FDSE III). A layer of protective silicon dioxide layer on the surface of wire array was created by thermal annealing in air at 1050 °C for MILF 9 h in a tube furnace (Lindberg/Blue M, Fisher Scientific). A conformal layer of ITO with 200-nm thickness was coated through reactive sputtering utilizing ULVAC RF sputtering system. Pt particles of two nm thickness was deposited on the wire’s surface with a Anatech Hummer 6.2 sputtering system. The morphology of prepared wire array was characterized by a SEM (JEOL JSM-6700F) outfitted with power dispersive X-ray spectroscopy (EDS, Ametek). LSV of the wire-array (Supplementary Fig. 3) in bulk minimal medium was obtained using a typical three-electrode set-up on Gamry 1010B potentiostat system. Th is da ta was w ritten by GSA Conte nt Generator DEMO!